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一种以xxx为稳定离子的阿尔法赛隆陶瓷及其制备方法

Release time:2026-07-06
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Patent Applicant:
清华大学
Disigner of the Invention:
张师嘉, 刘光华,Chenkexin
State of Patent:
未授权
Application Number:
CN202610069584.0
Service Invention or Not:
no
Application Date:
2026-01-19
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